(US10421929) Low-VOC cleaning substrates comprising a quat and ethoxylated/propdxylated fatty alcohol 机翻标题: 暂无翻译,请尝试点击翻译按钮。

源语言标题
(US10421929) Low-VOC cleaning substrates comprising a quat and ethoxylated/propdxylated fatty alcohol
公开号/公开日
US10421929US20180216044 / 2019-09-242018-08-02
申请号/申请日
US15/923,441 / 2018-03-16
发明人
COULTER SARAHJHA ASHISHMITCHELL DIANAOUELLETTE WILLIAMVANBUSKIRK GREGORY;
申请人
CLOROX;
主分类号
IPC分类号
A01N-033/12 A47L-013/17 C11D-001/00 C11D-001/62 C11D-001/66 C11D-001/72 C11D-001/722 C11D-001/835 C11D-003/43 C11D-003/48
摘要
(US10421929) A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
机翻摘要
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地址
代理人
(US10421929) Collins Erin
代理机构
;
优先权号
2012US-13543232 2014US-14174698 2014US-14317835 2015US-14954663 2018US-15923441
主权利要求
(US10421929) We claim: 1. A cleaning substrate comprising:   a) an absorbent substrate:   b) a cleaning composition, loaded onto said absorbent substrate, consisting of:   i. about 0.05-5% by weight of one or more cationic biocide,   ii. 0.01-5% by weight of one or more non-ionic surfactants containing at least one mixed ethylene oxide/propylene oxide adducts of long chain alcohols,   iii. about 0.05-5% by weight of a solvent comprising a glycol ether selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, ethylene glycol ethers, and any mixtures or combinations thereof,   iv. at least about 90% by weight of water; and   v. optionally, one or more adjuncts selected from the group consisting of: buffers, fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants and preservatives. 2. The cleaning substrate as defined in claim 1, wherein the composition further comprises a buffer. 3. The cleaning substrate as defined in claim 1, wherein the composition further comprises a fragrance. 4. The cleaning substrate as defined in claim 1, wherein the glycol ether is hexyl cellosolve. 5. The cleaning substrate as defined in claim 1, wherein the composition further comprises a preservative. 6. The cleaning substrate as defined in claim 5, wherein said cleaning composition contains about 0.05-2% by weight of said cationic biocide. 7. The cleaning substrate as defined in claim 1, wherein said cationic biocide includes a quaternary ammonium compound. 8. The cleaning substrate as defined in claim 5, wherein said cleaning composition contains about 0.01-2% by weight of said non-ionic surfactant. 9. A cleaning substrate comprising:   a) an absorbent substrate:   b) a cleaning composition, loaded onto said absorbent substrate, consisting of:   i. about 0.05-5% by weight of one or more quaternary ammonium compound,   ii. about 0.01-5% by weight of one or more non-ionic surfactants containing at least one mixed ethylene oxide/propylene oxide adducts of long chain alcohols,   iii. about 0.05-5% by weight of a solvent comprising hexyl cellosolve;   iv. at least about 90% by weight of water, and   v. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, buffers, defoamers, hydrotropes, biocide release agents, enzymes, bleaching agents, and preservatives. 10. The cleaning substrate as defined in claim 9, wherein the composition further comprises a buffer. 11. The cleaning substrate as defined in claim 9, wherein the composition further comprises a fragrance. 12. The cleaning substrate as defined in claim 9, wherein the cleaning composition contains about 0.05-3% by weight of hexyl cellosolve. 13. The cleaning substrate as defined in claim 9, wherein said cleaning composition contains about 0.05-2% by weight of said one or more quaternary ammonium compound. 14. The cleaning substrate as defined in claim 9, wherein the composition further comprises a preservative. 15. A cleaning substrate comprising:   a) an absorbent substrate:   b) a cleaning composition, loaded onto said absorbent substrate, consisting of:    i. about 0.05-2% by weight of one or more quaternary ammonium compounds;    ii. about 0.01-2% by weight of one or more non-ionic surfactants containing at least one mixed ethylene oxide/propylene oxide adduct of long chain alcohol;    iii. about 0.05-5% by weight of a solvent comprising a glycol ether selected from the group consisting of C1-10 alkyl ethers of alkylene glycols, ethylene glycol ethers, and any mixtures or combinations thereof,    iv. one or more fragrances;    v. at least 90% by weight of water; and    vi. optionally, one or more adjuncts selected from the group consisting of hydrotropes, buffers, defoamers, enzymes, bleaching agents, dyes, colorants and preservatives. 16. The cleaning composition as defined in claim 15, wherein said solvent is selected from the group substrate of: C1-10 alkyl ethers of alkylene glycols. 17. The cleaning substrate as defined in claim 15, wherein said solvent is selected from the group consisting of: ethylene glycol ethers. 18. The cleaning substrate as defined in claim 15, wherein said cleaning composition further comprises a buffer. 19. The cleaning substrate as defined in claim 15, wherein said solvent is hexyl cellosolve. 20. The cleaning substrate as defined in claim 15, wherein said cleaning composition further comprises a preservative.
法律状态
GRANTED
专利类型码
B2A1
国别省市代码
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