(US20200248108) Low-voc cleaning substrates and compositions 机翻标题: 暂无翻译,请尝试点击翻译按钮。

源语言标题
(US20200248108) Low-voc cleaning substrates and compositions
公开号/公开日
US20200248108 / 2020-08-06
申请号/申请日
US16/854,438 / 2020-04-21
发明人
MITCHELL DIANACOULTER SARAHJHA ASHISHOUELLETTE WILLIAMVAN BUSKIRK GREGORY;
申请人
CLOROX;
主分类号
IPC分类号
A01N-033/12 A47L-013/17 C11D-001/66 C11D-001/835 C11D-003/43 C11D-003/48
摘要
(US20200248108) A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
机翻摘要
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地址
代理人
代理机构
;
优先权号
2012US-13543232 2014US-14174698 2014US-14317835 2015US-14954663 2018US-15923441 2019US-16371775 2019US-16371788 2019US-16536015 2020US-16854438
主权利要求
(US20200248108) We claim: 1. A cleaning composition consisting of:   i. about 0.01-2% by weight of one or more cationic biocides;   ii. about 0.001-1% by weight of a non-ionic surfactant selected from the group consisting of: lauryl sulfate, lauryl ether sulfate, cocamidopropylbetaine, alkyl polyglycoside, and any combinations or mixtures thereof,   iii. about 0.1-2% by weight of a first solvent solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof.   iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, the second solvent being selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof.   v. at least about 90% by weight of water; and   vi. optionally, one or more adjuncts selected from the group consisting of: buffers, fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants, additional solvents and preservatives; and   wherein the cleaning composition has a cloud point that is 95° F. or less. 2. The cleaning composition as defined in claim 1, wherein the composition comprises a buffer. 3. The cleaning composition as defined in claim 1, wherein the composition comprises a fragrance. 4. The cleaning composition as defined in claim 1, wherein said cationic biocide includes a quaternary ammonium compound. 5. The cleaning composition as defined in claim 1, wherein the non-ionic surfactant is an alkyl polyglycoside. 6. The cleaning composition as defined in claim 1, wherein said first solvent includes a C1-10 alkyl ether of alkylene glycol. 7. The cleaning composition as defined in claim 1, wherein the first solvent includes a C1-10 alkyl ether of propylene glycol. 8. The cleaning composition as defined in claim 1, wherein the second solvent is an alcohol. 9. A cleaning composition consisting of:   i. about 0.01-2% by weight of one or more quaternary ammonium compounds;   ii. about 0.001-1% by weight of an alkyl polyglycoside surfactant;   iii. about 0.1-2% by weight of a first solvent solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof.   iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, the second solvent being selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;   v. about 0.001-1% by weight of a buffer;   vi. at least about 90% by weight of water; and   vii. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, hydrotropes, enzymes, bleaching agents, dyes, colorants, additional solvents and preservatives; and   wherein the cleaning composition has a cloud point that is 95° F. or less. 10. The cleaning composition as defined in claim 9, wherein the buffer is monoethanolamine. 11. The cleaning composition as defined in claim 9, wherein the composition comprises a fragrance. 12. The cleaning composition as defined in claim 9, wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride. 13. The cleaning composition as defined in claim 9, wherein said cleaning composition has a cloud point of 90° F. or less. 14. The cleaning composition as defined in claim 9, wherein the first solvent includes a C1-10 alkyl ether of alkylene glycol 15. The cleaning composition as defined in claim 9, wherein the second solvent is an alcohol. 16. A cleaning composition consisting of:   i. about 0.01-2% by weight of one or more quaternary ammonium compounds,   ii. about 0.15-1.5% by weight of an alkyl polyglycoside surfactant;   iii. about 0.1-2% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof,   iv. about 0.01-2% by weight of a second solvent, the second solvent being one or more alcohols;   v. one or more buffers;   vi. one or more fragrances;   vii. at least 90% by weight of water; and   wherein the cleaning composition has a cloud point that is 95° F. or less. 17. The cleaning composition as defined in claim 16, wherein said buffer is monoethanolamine. 18. The cleaning composition as defined in claim 16, wherein the first solvent includes a C1-10 alkyl ether of propylene glycol. 19. The cleaning composition as defined in claim 16, wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride. 20. The cleaning composition as defined in claim 16, wherein said second solvent is ethanol.
法律状态
PENDING
专利类型码
A1
国别省市代码
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